Single lithography-step planar metal-insulator-metal capacitor and resistor

MIMCAP semiconductor devices and methods for fabrication MIMCAP semiconductor devices that include a grown capacitor dielectric are provided. Exemplary MIMCAP semiconductor devices can include a bottom electrode, a grown capacitor dielectric on the bottom electrode, and a top electrode on the capacitor dielectric. The grown layer can have a k-value greater than 1 and can be formed of, for example, an oxide or nitride that is chemically or thermally grown from the bottom electrode.