Absolute position measurement system and method of producing material measure for the same
A position measurement system has a material measure provided with incremental and absolute markings, and a scanner movable relative to the markings, wherein the incremental markings are formed by periodically located recesses on the material measure, and the absolute marking are located between the...
Gespeichert in:
1. Verfasser: | |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | REUSING GUENTER |
description | A position measurement system has a material measure provided with incremental and absolute markings, and a scanner movable relative to the markings, wherein the incremental markings are formed by periodically located recesses on the material measure, and the absolute marking are located between the recesses of the material measure. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2007074416A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2007074416A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2007074416A13</originalsourceid><addsrcrecordid>eNqNi7EKwkAQBdNYiPoPC9ZCosHUQRR7tbEJa_JiDnK3x-2m8O-10N5qYJiZZ_f6oTJOBoqizpwE8mCdEjyCkb7U4IlD99E2SEfSU0zSTa0LT_JsSI7H30O9JLIBpOyxzGY9j4rVl4tsfTpeD-cNojTQyC0CrLldtnle5VVZFvu62P1XvQFrmTx1</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Absolute position measurement system and method of producing material measure for the same</title><source>esp@cenet</source><creator>REUSING GUENTER</creator><creatorcontrib>REUSING GUENTER</creatorcontrib><description>A position measurement system has a material measure provided with incremental and absolute markings, and a scanner movable relative to the markings, wherein the incremental markings are formed by periodically located recesses on the material measure, and the absolute marking are located between the recesses of the material measure.</description><language>eng</language><subject>ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVEREDIN A SINGLE OTHER SUBCLASS ; MEASURING ; MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE ; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR ; PHYSICS ; TARIFF METERING APPARATUS ; TESTING</subject><creationdate>2007</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20070405&DB=EPODOC&CC=US&NR=2007074416A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20070405&DB=EPODOC&CC=US&NR=2007074416A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>REUSING GUENTER</creatorcontrib><title>Absolute position measurement system and method of producing material measure for the same</title><description>A position measurement system has a material measure provided with incremental and absolute markings, and a scanner movable relative to the markings, wherein the incremental markings are formed by periodically located recesses on the material measure, and the absolute marking are located between the recesses of the material measure.</description><subject>ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVEREDIN A SINGLE OTHER SUBCLASS</subject><subject>MEASURING</subject><subject>MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE</subject><subject>MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR</subject><subject>PHYSICS</subject><subject>TARIFF METERING APPARATUS</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2007</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNi7EKwkAQBdNYiPoPC9ZCosHUQRR7tbEJa_JiDnK3x-2m8O-10N5qYJiZZ_f6oTJOBoqizpwE8mCdEjyCkb7U4IlD99E2SEfSU0zSTa0LT_JsSI7H30O9JLIBpOyxzGY9j4rVl4tsfTpeD-cNojTQyC0CrLldtnle5VVZFvu62P1XvQFrmTx1</recordid><startdate>20070405</startdate><enddate>20070405</enddate><creator>REUSING GUENTER</creator><scope>EVB</scope></search><sort><creationdate>20070405</creationdate><title>Absolute position measurement system and method of producing material measure for the same</title><author>REUSING GUENTER</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2007074416A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2007</creationdate><topic>ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVEREDIN A SINGLE OTHER SUBCLASS</topic><topic>MEASURING</topic><topic>MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE</topic><topic>MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR</topic><topic>PHYSICS</topic><topic>TARIFF METERING APPARATUS</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>REUSING GUENTER</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>REUSING GUENTER</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Absolute position measurement system and method of producing material measure for the same</title><date>2007-04-05</date><risdate>2007</risdate><abstract>A position measurement system has a material measure provided with incremental and absolute markings, and a scanner movable relative to the markings, wherein the incremental markings are formed by periodically located recesses on the material measure, and the absolute marking are located between the recesses of the material measure.</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | eng |
recordid | cdi_epo_espacenet_US2007074416A1 |
source | esp@cenet |
subjects | ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVEREDIN A SINGLE OTHER SUBCLASS MEASURING MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR PHYSICS TARIFF METERING APPARATUS TESTING |
title | Absolute position measurement system and method of producing material measure for the same |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-10T18%3A02%3A58IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=REUSING%20GUENTER&rft.date=2007-04-05&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2007074416A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |