Method for suppressing metal contamination in high temperature treatment of materials

Disclosed is a method for treating glass and crystalline inorganic materials whereby metal contamination during such process is inhibited. Such process includes treating the material in the presence of a purifying atmosphere comprising a cleansing gas. The process is especially advantageous for trea...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: LIKITVANICHKUL SUMALEE, SEMPOLINSKI DANIEL R, FAGAN JAMES G
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Disclosed is a method for treating glass and crystalline inorganic materials whereby metal contamination during such process is inhibited. Such process includes treating the material in the presence of a purifying atmosphere comprising a cleansing gas. The process is especially advantageous for treating high purity fused silica glass for use in advanced lithographic devices.