Method and Schottky diode structure for avoiding intrinsic NPM transistor operation

A Schottky diode includes an isolation region of a first conductivity type and an anode region of a second conductivity type isolated by the isolation region, the anode region including a lightly doped deep anode region of the second conductivity type and an increased dopant region of the second conductivity type, the increased dopant region including a shallow surface dopant spike region of the second conductivity type at a surface of the anode region. A heavily doped anode contact region of the second conductivity type electrically contacts the anode region, and a metal silicide cathode region is disposed in the surface dopant spike region. The peak dopant surface concentration is high enough to produce a predetermined saturation current density. The dopant concentration in the increased dopant region is sufficiently high to suppress the current gain of a parasitic bipolar transistor enough to adequately suppress operation of the parasitic bipolar transistor.