Facet mirrors and a method for producing mirror facets

In a method for producing mirror facets ( 1 ) for facet mirrors in illuminating devices or projection exposure machines in microlithography by using radiation in the extreme ultraviolet range, individual tilting angles are recessed into an optical surface ( 2 ) of the mirror facet ( 1 ), preferably...

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Bibliographische Detailangaben
Hauptverfasser:	MELZER FRANK, HEISLER ANDREAS, MANN HEINZ, SEIFERT ANDREAS, ROMEYN GERHARD
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	In a method for producing mirror facets ( 1 ) for facet mirrors in illuminating devices or projection exposure machines in microlithography by using radiation in the extreme ultraviolet range, individual tilting angles are recessed into an optical surface ( 2 ) of the mirror facet ( 1 ), preferably a surface with tilting angles relative to a reference surface of the mirror facet ( 1 ) is machined into or on said optical surface.