Vitreous printing by means of a silkscreen process

A enamel-free paste for use especially in ovens at temperatures of up to about 420° C. The paste contains a matrix based upon a silicon (Si) polymer that can be obtained by the hydrolysis and condensation of at least one silane of general formula RxSi(OR')4-x with at least one polysiloxane of g...

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Bibliographische Detailangaben
Hauptverfasser: SCHMIDMAYER GERHARD, LOSCHNER DETLEV V, KALLEDER AXEL, JORDENS FRANK
Format: Patent
Sprache:eng
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Zusammenfassung:A enamel-free paste for use especially in ovens at temperatures of up to about 420° C. The paste contains a matrix based upon a silicon (Si) polymer that can be obtained by the hydrolysis and condensation of at least one silane of general formula RxSi(OR')4-x with at least one polysiloxane of general formula [R2SiO]y, or R3Si-(O-SiR2)y-O-SiR3. The radicals R can independently be alkyl, aryl,arylalkyl, alkylaryl or H; the radicals R' can independently be H, methyl,ethyl, n- or i-propyl, n-, iso-, sec- or tert-butyl; x represents 0 or 1 (for the first silane); x represents 0, 1, 2, 3, or 4 (for each subsequent silane); and y represents a whole number, which is at least 2 and can be approximately infinite. The paste additionally includes a high-boiling organic solvent with a boiling point of 100° C. or above, and a pigment as the solvent, but does not include alcohol with a boiling point of below 100° C.