Support system for treatment apparatuses

A support system ( 1 ) for an apparatus of the type able to treat substrates and/or wafers is described, said system comprising a fixed base element ( 10 ) having a substantially flat surface in which a substantially cylindrical seat ( 11 ) with a substantially flat bottom is formed, and a movable s...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: SPECIALE NATALE, VALENTE GIANLUCA, CRIPPA DANILO
Format: Patent
Sprache:eng
Schlagworte:
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