Support system for treatment apparatuses

A support system ( 1 ) for an apparatus of the type able to treat substrates and/or wafers is described, said system comprising a fixed base element ( 10 ) having a substantially flat surface in which a substantially cylindrical seat ( 11 ) with a substantially flat bottom is formed, and a movable s...

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Bibliographische Detailangaben
Hauptverfasser:	SPECIALE NATALE, VALENTE GIANLUCA, CRIPPA DANILO
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE APPARATUS THEREFOR CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CONVEYING CRYSTAL GROWTH DIFFUSION TREATMENT OF METALLIC MATERIAL HANDLING THIN OR FILAMENTARY MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PACKING PERFORMING OPERATIONS PNEUMATIC TUBE CONVEYORS PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE REFINING BY ZONE-MELTING OF MATERIAL SHOP CONVEYOR SYSTEMS SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE SINGLE-CRYSTAL-GROWTH STORING SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING ORTIPPING TRANSPORTING UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL
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Beschreibung
Zusammenfassung:	A support system ( 1 ) for an apparatus of the type able to treat substrates and/or wafers is described, said system comprising a fixed base element ( 10 ) having a substantially flat surface in which a substantially cylindrical seat ( 11 ) with a substantially flat bottom is formed, and a movable support element ( 20 ) having a substantially disc-shaped form, being housed inside the seat ( 11 ), being able to rotate about the axis of the seat ( 11 ) and having a substantially flat upper side provided with at least one cavity ( 21 ) for a substrate or wafer and a substantially flat bottom side; one or more passages ( 12 ) for one or more gas flows are provided, which passages ( 12 ) emerge inside the seat ( 11 ) in directions which are inclined and preferably skew with respect to its axis, in such a way as to lift and rotate the support element ( 20 ).