Process analyzer for monitoring electrochemical deposition solutions

The present invention relates to process analyzers and processes employing same for analyzing composition of metal-containing samples such as electrochemical deposition solutions, wherein the analyzer includes at least one microelectrode, e.g. having a radius of not more than about 5 mum. The proces...

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Bibliographische Detailangaben
Hauptverfasser:	KING MACKENZIE E, STAPLES JOHN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS THEREFOR CHEMISTRY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING METALLURGY PHYSICS PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS TESTING
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Beschreibung
Zusammenfassung:	The present invention relates to process analyzers and processes employing same for analyzing composition of metal-containing samples such as electrochemical deposition solutions, wherein the analyzer includes at least one microelectrode, e.g. having a radius of not more than about 5 mum. The process analyzer preferably comprises: (1) two or more independent analytical modules, (2) a primary manifold communicatively connected to the analytical modules for introducing fluid samples thereinto, and (3) a computational device communicatively associated with the analytical modules for collecting and processing analytical data therefrom, to permit automatic and simultaneous analysis of multiple sample solutions.