Photosensitive fluororesin composition, cured film obtained from the composition, and method of forming pattern
[PROBLEM TO BE SOLVED] To provide a cured product, which is excellent in the prevention of adherence of a water repellent oil component, finger prints and the like and wiping-off properties (anti-fouling properties) thereof, as well as in thermal shock properties, adhesion or other properties, and a...
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| creator | YOKOYAMA KEN-ICHI SHIMADA MIBUKO NISHIKAWA AKIRA |
| description | [PROBLEM TO BE SOLVED] To provide a cured product, which is excellent in the prevention of adherence of a water repellent oil component, finger prints and the like and wiping-off properties (anti-fouling properties) thereof, as well as in thermal shock properties, adhesion or other properties, and a photosensitive fluororesin composition for easily providing the above cured product. [SOLUTION] A photosensitive fluororesin composition comprising (A) a fluorocopolymer, (B) a compound having at least two alkyletherized amino groups in its molecule, (C) a photosensitive acid generating agent, and (D) a solvent, wherein the fluorocopolymer (A) is a copolymer comprising (A1) a structural unit derived from at least one monomer selected from fluoro(meth)acrylic esters, fluoroolefins, and fluoroolefin derivatives and (A2) a structural unit derived from at least one monomer selected from hydroxyl-containing monomers, epoxy-containing monomers, and carboxyl-containing monomers. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2006246371A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2006246371A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2006246371A13</originalsourceid><addsrcrecordid>eNqNir0KwkAQBtNYiPoOC7YK-ZFYiyiWglqHM9kzB7n9jruNzy8BGzurYYaZZ7j2UCSW5NS9mewwIiJyckItfMDUIRtqx8gdWTd4wlONk8kiPGnPv6eRjjxrj45gySJ6Jy8KRpWjLLOZNUPi1ZeLbH0-3Y-XLQc0nIJpWVibx63M87rc1dW-OBTVf9cHsz5Esw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Photosensitive fluororesin composition, cured film obtained from the composition, and method of forming pattern</title><source>esp@cenet</source><creator>YOKOYAMA KEN-ICHI ; SHIMADA MIBUKO ; NISHIKAWA AKIRA</creator><creatorcontrib>YOKOYAMA KEN-ICHI ; SHIMADA MIBUKO ; NISHIKAWA AKIRA</creatorcontrib><description>[PROBLEM TO BE SOLVED] To provide a cured product, which is excellent in the prevention of adherence of a water repellent oil component, finger prints and the like and wiping-off properties (anti-fouling properties) thereof, as well as in thermal shock properties, adhesion or other properties, and a photosensitive fluororesin composition for easily providing the above cured product. [SOLUTION] A photosensitive fluororesin composition comprising (A) a fluorocopolymer, (B) a compound having at least two alkyletherized amino groups in its molecule, (C) a photosensitive acid generating agent, and (D) a solvent, wherein the fluorocopolymer (A) is a copolymer comprising (A1) a structural unit derived from at least one monomer selected from fluoro(meth)acrylic esters, fluoroolefins, and fluoroolefin derivatives and (A2) a structural unit derived from at least one monomer selected from hydroxyl-containing monomers, epoxy-containing monomers, and carboxyl-containing monomers.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; AUXILIARY PROCESSES IN PHOTOGRAPHY ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES ; PHYSICS</subject><creationdate>2006</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20061102&DB=EPODOC&CC=US&NR=2006246371A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25568,76551</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20061102&DB=EPODOC&CC=US&NR=2006246371A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YOKOYAMA KEN-ICHI</creatorcontrib><creatorcontrib>SHIMADA MIBUKO</creatorcontrib><creatorcontrib>NISHIKAWA AKIRA</creatorcontrib><title>Photosensitive fluororesin composition, cured film obtained from the composition, and method of forming pattern</title><description>[PROBLEM TO BE SOLVED] To provide a cured product, which is excellent in the prevention of adherence of a water repellent oil component, finger prints and the like and wiping-off properties (anti-fouling properties) thereof, as well as in thermal shock properties, adhesion or other properties, and a photosensitive fluororesin composition for easily providing the above cured product. [SOLUTION] A photosensitive fluororesin composition comprising (A) a fluorocopolymer, (B) a compound having at least two alkyletherized amino groups in its molecule, (C) a photosensitive acid generating agent, and (D) a solvent, wherein the fluorocopolymer (A) is a copolymer comprising (A1) a structural unit derived from at least one monomer selected from fluoro(meth)acrylic esters, fluoroolefins, and fluoroolefin derivatives and (A2) a structural unit derived from at least one monomer selected from hydroxyl-containing monomers, epoxy-containing monomers, and carboxyl-containing monomers.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>AUXILIARY PROCESSES IN PHOTOGRAPHY</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2006</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNir0KwkAQBtNYiPoOC7YK-ZFYiyiWglqHM9kzB7n9jruNzy8BGzurYYaZZ7j2UCSW5NS9mewwIiJyckItfMDUIRtqx8gdWTd4wlONk8kiPGnPv6eRjjxrj45gySJ6Jy8KRpWjLLOZNUPi1ZeLbH0-3Y-XLQc0nIJpWVibx63M87rc1dW-OBTVf9cHsz5Esw</recordid><startdate>20061102</startdate><enddate>20061102</enddate><creator>YOKOYAMA KEN-ICHI</creator><creator>SHIMADA MIBUKO</creator><creator>NISHIKAWA AKIRA</creator><scope>EVB</scope></search><sort><creationdate>20061102</creationdate><title>Photosensitive fluororesin composition, cured film obtained from the composition, and method of forming pattern</title><author>YOKOYAMA KEN-ICHI ; SHIMADA MIBUKO ; NISHIKAWA AKIRA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2006246371A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2006</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>AUXILIARY PROCESSES IN PHOTOGRAPHY</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>YOKOYAMA KEN-ICHI</creatorcontrib><creatorcontrib>SHIMADA MIBUKO</creatorcontrib><creatorcontrib>NISHIKAWA AKIRA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YOKOYAMA KEN-ICHI</au><au>SHIMADA MIBUKO</au><au>NISHIKAWA AKIRA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Photosensitive fluororesin composition, cured film obtained from the composition, and method of forming pattern</title><date>2006-11-02</date><risdate>2006</risdate><abstract>[PROBLEM TO BE SOLVED] To provide a cured product, which is excellent in the prevention of adherence of a water repellent oil component, finger prints and the like and wiping-off properties (anti-fouling properties) thereof, as well as in thermal shock properties, adhesion or other properties, and a photosensitive fluororesin composition for easily providing the above cured product. [SOLUTION] A photosensitive fluororesin composition comprising (A) a fluorocopolymer, (B) a compound having at least two alkyletherized amino groups in its molecule, (C) a photosensitive acid generating agent, and (D) a solvent, wherein the fluorocopolymer (A) is a copolymer comprising (A1) a structural unit derived from at least one monomer selected from fluoro(meth)acrylic esters, fluoroolefins, and fluoroolefin derivatives and (A2) a structural unit derived from at least one monomer selected from hydroxyl-containing monomers, epoxy-containing monomers, and carboxyl-containing monomers.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS |
| title | Photosensitive fluororesin composition, cured film obtained from the composition, and method of forming pattern |
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