Photosensitive fluororesin composition, cured film obtained from the composition, and method of forming pattern

[PROBLEM TO BE SOLVED] To provide a cured product, which is excellent in the prevention of adherence of a water repellent oil component, finger prints and the like and wiping-off properties (anti-fouling properties) thereof, as well as in thermal shock properties, adhesion or other properties, and a...

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Bibliographische Detailangaben
Hauptverfasser:	YOKOYAMA KEN-ICHI, SHIMADA MIBUKO, NISHIKAWA AKIRA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS
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Beschreibung
Zusammenfassung:	[PROBLEM TO BE SOLVED] To provide a cured product, which is excellent in the prevention of adherence of a water repellent oil component, finger prints and the like and wiping-off properties (anti-fouling properties) thereof, as well as in thermal shock properties, adhesion or other properties, and a photosensitive fluororesin composition for easily providing the above cured product. [SOLUTION] A photosensitive fluororesin composition comprising (A) a fluorocopolymer, (B) a compound having at least two alkyletherized amino groups in its molecule, (C) a photosensitive acid generating agent, and (D) a solvent, wherein the fluorocopolymer (A) is a copolymer comprising (A1) a structural unit derived from at least one monomer selected from fluoro(meth)acrylic esters, fluoroolefins, and fluoroolefin derivatives and (A2) a structural unit derived from at least one monomer selected from hydroxyl-containing monomers, epoxy-containing monomers, and carboxyl-containing monomers.