Optical system with nanoscale projection antireflection layer/embossing

An optical system having a radiation transparent member and an anti-reflective embossment embossed into at least one surface of the transparent member. The embossment has spaced structures configured to permit incident radiation to pass through the embossment and the radiation transparent member, an...

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Hauptverfasser: GARDNER DANIEL C, PIEHL ARTHUR R
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creator GARDNER DANIEL C
PIEHL ARTHUR R
description An optical system having a radiation transparent member and an anti-reflective embossment embossed into at least one surface of the transparent member. The embossment has spaced structures configured to permit incident radiation to pass through the embossment and the radiation transparent member, and to, at least, attenuate reflection of the incident radiation off the embossment. The structures are maximally spaced from one another by a subwavelength of the incident radiation.
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subjects DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING
FREQUENCY-CHANGING
NON-LINEAR OPTICS
OPTICAL ANALOGUE/DIGITAL CONVERTERS
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICAL LOGIC ELEMENTS
OPTICS
PHYSICS
TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
title Optical system with nanoscale projection antireflection layer/embossing
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