Optical system with nanoscale projection antireflection layer/embossing

An optical system having a radiation transparent member and an anti-reflective embossment embossed into at least one surface of the transparent member. The embossment has spaced structures configured to permit incident radiation to pass through the embossment and the radiation transparent member, an...

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Bibliographische Detailangaben
Hauptverfasser:	GARDNER DANIEL C, PIEHL ARTHUR R
Format:	Patent
Sprache:	eng
Schlagworte:	DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING FREQUENCY-CHANGING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	An optical system having a radiation transparent member and an anti-reflective embossment embossed into at least one surface of the transparent member. The embossment has spaced structures configured to permit incident radiation to pass through the embossment and the radiation transparent member, and to, at least, attenuate reflection of the incident radiation off the embossment. The structures are maximally spaced from one another by a subwavelength of the incident radiation.