Submicron particle removal

A system for non-contact cleaning of particulate contamination of surfaces includes one or more sources that create a charge imbalance between a surface and particles that contaminate the surface, and a power supply that creates a pulsed electrical bias on the surface. This imbalance produces an ele...

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Bibliographische Detailangaben
Hauptverfasser:	NEUMANN MARTIN J, QIU HUATAN, ALMAN DARREN, RUZIC DAVID N, JURCZYK BRIAN E
Format:	Patent
Sprache:	eng
Schlagworte:	CONVERSION OF CHEMICAL ELEMENTS ELECTROTHERAPY HUMAN NECESSITIES HYGIENE MAGNETOTHERAPY MEDICAL OR VETERINARY SCIENCE NUCLEAR ENGINEERING NUCLEAR PHYSICS PHYSICS RADIATION THERAPY RADIOACTIVE SOURCES ULTRASOUND THERAPY
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Beschreibung
Zusammenfassung:	A system for non-contact cleaning of particulate contamination of surfaces includes one or more sources that create a charge imbalance between a surface and particles that contaminate the surface, and a power supply that creates a pulsed electrical bias on the surface. This imbalance produces an electrostatic force that propels the particles off the surface. The cleaning process can be associated, for example, with microelectronic lithography and manufacturing.