Plasma generating electrode, plasma generation device, and exhaust gas purifying apparatus

A plasma generating electrode 1 of the invention includes at least a pair of electrodes 5 , at least one electrode 5 a of the pair of electrodes 5 including a plate-like ceramic body 2 as a dielectric and a plurality of conductive films 3 disposed in the ceramic body 2 and each having a plurality of...

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Bibliographische Detailangaben
Hauptverfasser:	MASUDA MASAAKI, SAKUMA TAKESHI, IMANISHI YUUICHIRO, MIKI MASANOBU, HATANO TATSUHIKO, DOSAKA KENJI, MIYAIRI YUKIO, FUJIOKA YASUMASA
Format:	Patent
Sprache:	eng
Schlagworte:	BLASTING CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ENGINE PLANTS IN GENERAL GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNALCOMBUSTION ENGINES GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES ORENGINES IN GENERAL HEATING LIGHTING MACHINES OR ENGINES IN GENERAL MECHANICAL ENGINEERING PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEPARATION STEAM ENGINES THEIR RELEVANT APPARATUS TRANSPORTING WEAPONS
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Beschreibung
Zusammenfassung:	A plasma generating electrode 1 of the invention includes at least a pair of electrodes 5 , at least one electrode 5 a of the pair of electrodes 5 including a plate-like ceramic body 2 as a dielectric and a plurality of conductive films 3 disposed in the ceramic body 2 and each having a plurality of through-holes 4 formed through the conductive film 3 in its thickness direction in a predetermined arrangement pattern, the through-holes 4 having a cross-sectional shape including an arc shape along a plane perpendicular to the thickness direction, an arrangement pattern of the through-holes 4 a formed in at least one conductive film 3 a being different from an arrangement pattern of the through-holes 4 b formed in the other conductive film 3 b. The plasma generating electrode 1 is capable of simultaneously generating different states of plasma upon application of voltage between the pair of electrodes 5 due to the different arrangement patterns of the through-holes 4 in the conductive films 3.