Translation generation for a mask pattern
Generation of one or more translations is described. The generated translations may be applied to a mask pattern so that the pattern may be moved to cover one or more mask defects in part or in totality.
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | Generation of one or more translations is described. The generated translations may be applied to a mask pattern so that the pattern may be moved to cover one or more mask defects in part or in totality. |
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