Method for making a planar suspended microstructure, using a sacrificial layer of polymer material and resulting component

Production process of a flat suspended micro-structure using a sacrificial layer of polymer material and component obtained thereby The process successively comprises deposition of a sacrificial layer ( 2 ) of polymer material, deposition, on at least a part of the substrate ( 1 ) and of the front f...

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Bibliographische Detailangaben
Hauptverfasser:	SILLON NICOLAS, MICHEL FRANCE, MAEDER-PACHURKA CATHERINE, ROBERT PHILIPPE
Format:	Patent
Sprache:	eng
Schlagworte:	ADDITIVE MANUFACTURING TECHNOLOGY ADDITIVE MANUFACTURING, i.e. MANUFACTURING OFTHREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVEAGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING,STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING BASIC ELECTRIC ELEMENTS CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CURRENT COLLECTORS DECORATIVE ARTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY LINE CONNECTORS MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS MEASURING MEASURING ELECTRIC VARIABLES MEASURING MAGNETIC VARIABLES MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICALDEVICES MICROSTRUCTURAL TECHNOLOGY MOSAICS PAPERHANGING PERFORMING OPERATIONS PHYSICS PRINTED CIRCUITS PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS PRODUCING DECORATIVE EFFECTS SEMICONDUCTOR DEVICES TARSIA WORK TESTING TRANSPORTING
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Beschreibung
Zusammenfassung:	Production process of a flat suspended micro-structure using a sacrificial layer of polymer material and component obtained thereby The process successively comprises deposition of a sacrificial layer ( 2 ) of polymer material, deposition, on at least a part of the substrate ( 1 ) and of the front face of the sacrificial layer ( 2 ), of an embedding layer ( 6 ), the thickness whereof is larger than that of the sacrificial layer ( 2 ), and planarization so that the front faces of the sacrificial layer ( 2 ) and of the embedding layer ( 6 ) form a common flat surface. A formation layer ( 3 ) of a suspended structure ( 5 ) is deposited on the front face of the common flat surface. Planarization can comprise chemical mechanical polishing and etching of the embedding layer ( 6 ). Etching of the sacrificial layer ( 2 ) can be performed by means of a mask formed on the front face of a layer of polymer material eliminated during the planarization step.