Method for producing containing fullerene and apparatus for producing same

A method for producing endohedral fullerenes at a higher yield and an apparatus therefor are disclosed. The apparatus includes a vacuum vessel ( 1 ), elements ( 3, 4 ) for generating a plasma current ( 2 ) of atoms to be contained, elements ( 8 ) for introducing fullerenes into the plasma current (...

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Bibliographische Detailangaben
Hauptverfasser:	YOKOH KUNIYOSHI, KASAMA YASUHIKO, OMOTE KENJI, HATAKEYAMA RIKIZO, HIRATA TAKAMICHI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOUNDS THEREOF DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INORGANIC CHEMISTRY METALLURGY NON-METALLIC ELEMENTS PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A method for producing endohedral fullerenes at a higher yield and an apparatus therefor are disclosed. The apparatus includes a vacuum vessel ( 1 ), elements ( 3, 4 ) for generating a plasma current ( 2 ) of atoms to be contained, elements ( 8 ) for introducing fullerenes into the plasma current ( 2 ), a holding member ( 6 ) for holding a plurality of division plates ( 5 a, 5 b, 5 c) concentrically divided and arranged in the downstream region of the plasma current ( 2 ), and a bias-applying unit ( 7 a, 7 b, 7 c) for applying an arbitrary bias voltage to the division plates ( 5 a, 5 b, 5 c).