Method to produce thin film resistor with no resistor head using dry etch

Method to produce thin film resistor with no resistor head using dry etch

A method of fabricating a thin film resistor ( 100 ) without a hardmask or resistor head. The resistor material ( 104 ), e.g., NiCr, is deposited. The resistor material ( 104 ) is patterned and sputter etched to form the resistor body without first depositing a hardmask material. For example, a sput...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: TSAI DANIEL, PHAN TONY T
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:A method of fabricating a thin film resistor ( 100 ) without a hardmask or resistor head. The resistor material ( 104 ), e.g., NiCr, is deposited. The resistor material ( 104 ) is patterned and sputter etched to form the resistor body without first depositing a hardmask material. For example, a sputter etch chemistry comprising BCl3, Cl2, and Ar may be used to etch the resistor material.