Lithographic apparatus and device manufacturing method

A lithographic apparatus is disclosed having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elemen...

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Bibliographische Detailangaben
Hauptverfasser:	QUAEDACKERS JOHANNES A, STAVENGA MARCO K, TINNEMANS PATRICIUS A.J, DE JONG FREDERIK E, HUBERTUS MUITJENS MARCEL J.E, MOERMAN RICHARD, VAN DER NET ANTONIUS J, MENCHTCHIKOV BORIS, OTTENS JOOST J, CADEE THEODORUS P.M, DE MOL CHRISTIANUS G.M, MARIA MERTENS JEROEN J.S, NIHTIANOV STOYAN, VERHAGEN MARTINUS C.M, SMEETS MARTIN F.P, JACOBS JOHANNES H.W, KATE NICOLAAS T, REUHMAN-HUISKEN MARIA E, LOOPSTRA ERIK R, BOOM HERMAN, JANSSEN FRANCISCUS J.J, GOORMAN KOEN, SCHOONDERMARK BART L.P, RIEPEN MICHEL, HENDRICUS VERSPAY JACOBUS JOHANNUS L, VERMEER ASCHWIN LODEWIJK H.J
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A lithographic apparatus is disclosed having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.