Resistor element with uniform resistance being independent of process variations, semiconductor integrated circuit device having the same, and fabrication methods thereof
Provided is a resistor element including a resistor formed on an insulating layer, and a complementary resistor formed on the insulating layer and insulated from the resistor, the complementary resistor electrically connected in parallel to the resistor, wherein a resistance of the complementary res...
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creator | SEO HYEOUNG-WON SHIN SHANG-KYU KIM SUN-JOON KIM HYUNANG |
description | Provided is a resistor element including a resistor formed on an insulating layer, and a complementary resistor formed on the insulating layer and insulated from the resistor, the complementary resistor electrically connected in parallel to the resistor, wherein a resistance of the complementary resistor is complementary to a resistance of the resistor. A semiconductor integrated circuit device including the resistor element, and methods of fabricating the resistor element and the semiconductor integrated circuit device are also provided. |
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A semiconductor integrated circuit device including the resistor element, and methods of fabricating the resistor element and the semiconductor integrated circuit device are also provided.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; RESISTORS ; SEMICONDUCTOR DEVICES</subject><creationdate>2006</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20060112&DB=EPODOC&CC=US&NR=2006006981A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20060112&DB=EPODOC&CC=US&NR=2006006981A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SEO HYEOUNG-WON</creatorcontrib><creatorcontrib>SHIN SHANG-KYU</creatorcontrib><creatorcontrib>KIM SUN-JOON</creatorcontrib><creatorcontrib>KIM HYUNANG</creatorcontrib><title>Resistor element with uniform resistance being independent of process variations, semiconductor integrated circuit device having the same, and fabrication methods thereof</title><description>Provided is a resistor element including a resistor formed on an insulating layer, and a complementary resistor formed on the insulating layer and insulated from the resistor, the complementary resistor electrically connected in parallel to the resistor, wherein a resistance of the complementary resistor is complementary to a resistance of the resistor. 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subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY RESISTORS SEMICONDUCTOR DEVICES |
title | Resistor element with uniform resistance being independent of process variations, semiconductor integrated circuit device having the same, and fabrication methods thereof |
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