Resistor element with uniform resistance being independent of process variations, semiconductor integrated circuit device having the same, and fabrication methods thereof

Provided is a resistor element including a resistor formed on an insulating layer, and a complementary resistor formed on the insulating layer and insulated from the resistor, the complementary resistor electrically connected in parallel to the resistor, wherein a resistance of the complementary res...

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Hauptverfasser: SEO HYEOUNG-WON, SHIN SHANG-KYU, KIM SUN-JOON, KIM HYUNANG
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creator SEO HYEOUNG-WON
SHIN SHANG-KYU
KIM SUN-JOON
KIM HYUNANG
description Provided is a resistor element including a resistor formed on an insulating layer, and a complementary resistor formed on the insulating layer and insulated from the resistor, the complementary resistor electrically connected in parallel to the resistor, wherein a resistance of the complementary resistor is complementary to a resistance of the resistor. A semiconductor integrated circuit device including the resistor element, and methods of fabricating the resistor element and the semiconductor integrated circuit device are also provided.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2006006981A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2006006981A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2006006981A13</originalsourceid><addsrcrecordid>eNqNjM1KA0EQhPfiQaLv0OA1QqIgepSgePbnHDozNdmGTM_S3bu-k0_pbvABhKLqUB_fZffzDhePZoQTKjToW6KnUaU0q2TnlzWBDhA9kmjGgLlmshUarCW408QmHNLU1-SokprmMS1a0cDROJApiaVRgjImmYU9T4sxepBzxZpYMxU-mKSziiqib9kXwtDKVXdR-OS4_ttVd_P68rl7u8XQ9vCBExSx__q422we5jw9bp-39_-jfgFlbls5</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Resistor element with uniform resistance being independent of process variations, semiconductor integrated circuit device having the same, and fabrication methods thereof</title><source>esp@cenet</source><creator>SEO HYEOUNG-WON ; SHIN SHANG-KYU ; KIM SUN-JOON ; KIM HYUNANG</creator><creatorcontrib>SEO HYEOUNG-WON ; SHIN SHANG-KYU ; KIM SUN-JOON ; KIM HYUNANG</creatorcontrib><description>Provided is a resistor element including a resistor formed on an insulating layer, and a complementary resistor formed on the insulating layer and insulated from the resistor, the complementary resistor electrically connected in parallel to the resistor, wherein a resistance of the complementary resistor is complementary to a resistance of the resistor. A semiconductor integrated circuit device including the resistor element, and methods of fabricating the resistor element and the semiconductor integrated circuit device are also provided.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; RESISTORS ; SEMICONDUCTOR DEVICES</subject><creationdate>2006</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20060112&amp;DB=EPODOC&amp;CC=US&amp;NR=2006006981A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20060112&amp;DB=EPODOC&amp;CC=US&amp;NR=2006006981A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SEO HYEOUNG-WON</creatorcontrib><creatorcontrib>SHIN SHANG-KYU</creatorcontrib><creatorcontrib>KIM SUN-JOON</creatorcontrib><creatorcontrib>KIM HYUNANG</creatorcontrib><title>Resistor element with uniform resistance being independent of process variations, semiconductor integrated circuit device having the same, and fabrication methods thereof</title><description>Provided is a resistor element including a resistor formed on an insulating layer, and a complementary resistor formed on the insulating layer and insulated from the resistor, the complementary resistor electrically connected in parallel to the resistor, wherein a resistance of the complementary resistor is complementary to a resistance of the resistor. A semiconductor integrated circuit device including the resistor element, and methods of fabricating the resistor element and the semiconductor integrated circuit device are also provided.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>RESISTORS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2006</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjM1KA0EQhPfiQaLv0OA1QqIgepSgePbnHDozNdmGTM_S3bu-k0_pbvABhKLqUB_fZffzDhePZoQTKjToW6KnUaU0q2TnlzWBDhA9kmjGgLlmshUarCW408QmHNLU1-SokprmMS1a0cDROJApiaVRgjImmYU9T4sxepBzxZpYMxU-mKSziiqib9kXwtDKVXdR-OS4_ttVd_P68rl7u8XQ9vCBExSx__q422we5jw9bp-39_-jfgFlbls5</recordid><startdate>20060112</startdate><enddate>20060112</enddate><creator>SEO HYEOUNG-WON</creator><creator>SHIN SHANG-KYU</creator><creator>KIM SUN-JOON</creator><creator>KIM HYUNANG</creator><scope>EVB</scope></search><sort><creationdate>20060112</creationdate><title>Resistor element with uniform resistance being independent of process variations, semiconductor integrated circuit device having the same, and fabrication methods thereof</title><author>SEO HYEOUNG-WON ; SHIN SHANG-KYU ; KIM SUN-JOON ; KIM HYUNANG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2006006981A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2006</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>RESISTORS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>SEO HYEOUNG-WON</creatorcontrib><creatorcontrib>SHIN SHANG-KYU</creatorcontrib><creatorcontrib>KIM SUN-JOON</creatorcontrib><creatorcontrib>KIM HYUNANG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SEO HYEOUNG-WON</au><au>SHIN SHANG-KYU</au><au>KIM SUN-JOON</au><au>KIM HYUNANG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Resistor element with uniform resistance being independent of process variations, semiconductor integrated circuit device having the same, and fabrication methods thereof</title><date>2006-01-12</date><risdate>2006</risdate><abstract>Provided is a resistor element including a resistor formed on an insulating layer, and a complementary resistor formed on the insulating layer and insulated from the resistor, the complementary resistor electrically connected in parallel to the resistor, wherein a resistance of the complementary resistor is complementary to a resistance of the resistor. A semiconductor integrated circuit device including the resistor element, and methods of fabricating the resistor element and the semiconductor integrated circuit device are also provided.</abstract><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
RESISTORS
SEMICONDUCTOR DEVICES
title Resistor element with uniform resistance being independent of process variations, semiconductor integrated circuit device having the same, and fabrication methods thereof
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-25T14%3A29%3A11IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=SEO%20HYEOUNG-WON&rft.date=2006-01-12&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2006006981A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true