Resistor element with uniform resistance being independent of process variations, semiconductor integrated circuit device having the same, and fabrication methods thereof

Provided is a resistor element including a resistor formed on an insulating layer, and a complementary resistor formed on the insulating layer and insulated from the resistor, the complementary resistor electrically connected in parallel to the resistor, wherein a resistance of the complementary res...

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Bibliographische Detailangaben
Hauptverfasser: SEO HYEOUNG-WON, SHIN SHANG-KYU, KIM SUN-JOON, KIM HYUNANG
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:Provided is a resistor element including a resistor formed on an insulating layer, and a complementary resistor formed on the insulating layer and insulated from the resistor, the complementary resistor electrically connected in parallel to the resistor, wherein a resistance of the complementary resistor is complementary to a resistance of the resistor. A semiconductor integrated circuit device including the resistor element, and methods of fabricating the resistor element and the semiconductor integrated circuit device are also provided.