Area based optical proximity correction in raster scan printing

Methods and apparatus for correcting defects, such as rounded corners and line end shortening, in patterns formed via lithography are provided. Such defects are compensated for "post-rasterization" by manipulating the grayscale values of pixel maps.

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Bibliographische Detailangaben
Hauptverfasser: HUBBARD JOHN J, CHABRECK THOMAS E, HOWELLS SAMUEL C, TEITZEL ROBIN L
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Methods and apparatus for correcting defects, such as rounded corners and line end shortening, in patterns formed via lithography are provided. Such defects are compensated for "post-rasterization" by manipulating the grayscale values of pixel maps.