Three-dimensional lithographic fabrication technique

Three-dimensional lithographic fabrication technique

Embodiments of a structure and embodiments of methods for fabricating structures provide three dimensional features defined by exposure to multiple wavelengths of light. In an embodiment, material is exposed to two different wavelengths of light. Embodiments of three dimensional structures may provi...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: FRAUENGLASS ANDREW
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
MICROSTRUCTURAL TECHNOLOGY
PERFORMING OPERATIONS
PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
SEMICONDUCTOR DEVICES
TRANSPORTING
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Beschreibung
Zusammenfassung:Embodiments of a structure and embodiments of methods for fabricating structures provide three dimensional features defined by exposure to multiple wavelengths of light. In an embodiment, material is exposed to two different wavelengths of light. Embodiments of three dimensional structures may provide a variety of three-dimensional structural features and characteristics.