Method and system for supplying carbon dioxide to a semiconductor tool having variable flow requirement

Provided is a novel method and system for supplying high-pressure carbon dioxide to an application having a variable carbon dioxide flow requirement. The method includes providing a high-pressure carbon dioxide feed stream to a buffer volume and determining the amount of carbon dioxide to be deliver...

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Bibliographische Detailangaben
Hauptverfasser:	TIMM MARTIN L, BILLINGHAM JOHN F, JOHNSON MICHAEL C
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS BLASTING CHEMICAL SURFACE TREATMENT CHEMISTRY CLEANING CLEANING IN GENERAL CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOUNDS THEREOF DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED,LIQUEFIED, OR SOLIDIFIED GASES FIXED-CAPACITY GAS-HOLDERS HEATING INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INORGANIC CHEMISTRY LIGHTING MECHANICAL ENGINEERING METALLURGY NON-METALLIC ELEMENTS PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES STORING OF DISTRIBUTING GASES OR LIQUIDS TRANSPORTING VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED ORSOLIDIFIED GASES WEAPONS
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Beschreibung
Zusammenfassung:	Provided is a novel method and system for supplying high-pressure carbon dioxide to an application having a variable carbon dioxide flow requirement. The method includes providing a high-pressure carbon dioxide feed stream to a buffer volume and determining the amount of carbon dioxide to be delivered to the application tool. The pressure in the buffer volume is maintained at a pressure that exceeds the pressure required by the application tool. The temperature in the buffer volume is further adjusted to modify the density of the carbon dioxide and based thereon the size of the buffer volume. Thereafter, the carbon dioxide from the buffer volume is delivered at a variable flow rate as required by the application tool.