Reverse conducting semiconductor device and a fabrication method thereof

To provide a reverse conducting semiconductor device in which an insulated gate bipolar transistor and a free wheeling diode excellent in recovery characteristic are monolithically formed on a substrate, the free wheeling diode including; a second conductive type base layer to constitute the insulat...

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Bibliographische Detailangaben
Hauptverfasser: AONO SHINJI, YAMAMOTO KENZO, YAMAMOTO AYA, TAKAHASHI HIDEKI, YAMAMOTO IKUKO
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:To provide a reverse conducting semiconductor device in which an insulated gate bipolar transistor and a free wheeling diode excellent in recovery characteristic are monolithically formed on a substrate, the free wheeling diode including; a second conductive type base layer to constitute the insulated gate bipolar transistor; a first conductive type base layer for constituting the insulated gate bipolar transistor, an anode electrode which is an emitter electrode covering a first conductive type emitter layer and the second conductive type base layer, a cathode electrode which is a collector electrode covering the first conductive type base layer and a second conductive type collector layer formed on the part of the first conductive type base layer, wherein a short lifetime region is formed on a part of the first conductive type base layer.