Contaminant reducing substrate transport and support system

A lifting assembly can lift a substrate from a substrate support and transport the substrate. The lift assembly has a hoop sized to fit about a periphery of the substrate support, and a pair of arcuate fins mounted on the hoop, each arcuate fin comprising a pair of opposing ends having ledges that e...

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Hauptverfasser: ANGELO DARRYL, SUH SONG-MOON, FAY RICHARD, PARKHE VIJAY D, KHURANA NITIN, HAGERTY CHRISTOPHER, MARTIN TODD W, AHMAN KURT J, TSAI MATTHEW C, NG EDWARD, RICE MICHAEL, LEOPOLD MATTHEW, RONAN TIMOTHY, SANSONI STEVE
Format: Patent
Sprache:eng
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Zusammenfassung:A lifting assembly can lift a substrate from a substrate support and transport the substrate. The lift assembly has a hoop sized to fit about a periphery of the substrate support, and a pair of arcuate fins mounted on the hoop, each arcuate fin comprising a pair of opposing ends having ledges that extend radially inward, each ledge having a raised protrusion to lift a substrate so that the substrate contacts substantially only the raised protrusion, thereby minimizing contact with the ledge, when the pair of fins is used to lift the substrate off the substrate support. The lifting assembly and other process chamber components can have a diamond-like coating having interlinked networks of (i) carbon and hydrogen, and (ii) silicon and oxygen. The diamond-like coating has a contact surface having a coefficient of friction of less than about 0.3, a hardness of at least about 8 GPa, and a metal concentration level of less than about 5x1012 atoms/cm2 of metal. The contact surface reduces contamination of a substrate when directly or indirectly contacting a substrate.