Method for producing microhole structures

The invention relates to a novel method for producing microhole structures. According to said method, the material used to produce said microhole structures is applied to a substrate surface provided with a relief structure, by means of an angular coating process. In order to achieve the desired pat...

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Bibliographische Detailangaben
Hauptverfasser:	SCHLEMMER CHRISTIAN, BLASI BENEDIKT, BOERNER VOLKMAR, NIGGEMANN MICHAEL, ROBERT JOSEF, GOMBERT ANDREAS, GEHRKE ILKA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PHYSICS SEPARATION TRANSPORTING
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Beschreibung
Zusammenfassung:	The invention relates to a novel method for producing microhole structures. According to said method, the material used to produce said microhole structures is applied to a substrate surface provided with a relief structure, by means of an angular coating process. In order to achieve the desired pattern of holes, the relief structure has a continuous network of first surface elements and second surface elements located thereinbetween, the local surface normal vectors of the first surface elements forming a small angle with the unit vector, and the local surface normal vectors of the second surface elements forming a small angle with the direction vector of the coating.