Method and system for controlling a product parameter of a circuit element

Methods and systems are disclosed that allow an adjustment of a product parameter, such as operating speed, of a circuit element, such as a field effect transistor, during the fabrication of the device. A manufacturing process downstream of a first controlled process is controlled by a superior cont...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HERRMANN LUTZ, RAEBIGER JAN, HOLFELD ANDRE
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Methods and systems are disclosed that allow an adjustment of a product parameter, such as operating speed, of a circuit element, such as a field effect transistor, during the fabrication of the device. A manufacturing process downstream of a first controlled process is controlled by a superior control scheme in response to the measurement data of the first and second processes and on the basis of a sensitivity function, which describes the effect a variation of the product parameter generates in the measurement data. The superior control scheme may provide a compensated target value for the downstream process.