Methods and apparatus for cleaning and drying a work piece

Methods and apparatus for cleaning and drying a work piece

Methods and apparatus are provided for the cleaning and drying of a work piece. The apparatus comprises a carrier configured to carry a work piece that has a surface. The apparatus further comprises a press plate having a first surface and a second surface. During a cleaning process, the carrier, th...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: DINNEEN MARK, STOWELL R. M, JANICKI MICHAEL J, CLEARY TIM
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
CLEANING
CLEANING IN GENERAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PERFORMING OPERATIONS
PREVENTION OF FOULING IN GENERAL
SEMICONDUCTOR DEVICES
TRANSPORTING
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Beschreibung
Zusammenfassung:Methods and apparatus are provided for the cleaning and drying of a work piece. The apparatus comprises a carrier configured to carry a work piece that has a surface. The apparatus further comprises a press plate having a first surface and a second surface. During a cleaning process, the carrier, the press plate, or both, is configured to move relative to the other. The press plate is disposed a distance from the surface of the work piece such that, when a cleaning fluid is disposed between the work piece and the press plate, the surface tension of the cleaning fluid maintains a meniscus between the work piece and the press plate. A mega-sonic transducer is coupled to the second surface of the press plate.