Lithography mask for imaging of convex structures

A lithography mask has an angled structure element (O) formed by a first opaque segment (O 1 ) and by a second opaque segment (O 2 ). The structure element has at least one reflex angle (alpha). The angled structure element (O) includes at least one convex section (A) facing the reflex angle (alpha)...

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Bibliographische Detailangaben
Hauptverfasser: AHRENS MARCO, KOHLE RODERICK, LUDWIG BURKHARD, MOUKARA MOLELA, THIELE JORG, PFORR RAINER, MORGANA NICOLO
Format: Patent
Sprache:eng
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Zusammenfassung:A lithography mask has an angled structure element (O) formed by a first opaque segment (O 1 ) and by a second opaque segment (O 2 ). The structure element has at least one reflex angle (alpha). The angled structure element (O) includes at least one convex section (A) facing the reflex angle (alpha). At least one transparent structure (T) adjacent to the angled structure element (O) is provided at the convex section (A) of the angled structure element (O). The transparent structure (T) is formed in separated fashion at the convex section (A) of the angled structure element (O) and thus comprises two distinguishable transparent segments (T 1 , T 2 ) formed at least in sections essentially axially symmetrically with respect to the angle bisector (WH) of the reflex angle.