System and method of measurement, system and method of alignment, lithographic apparatus and method

A lithographic apparatus includes a measurement system including at least one optical component and at least one electrical component. The electrical component is configured to dissipate heat. The optical component is mounted on a first frame of the apparatus, and the electrical component is mounted...

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Bibliographische Detailangaben
Hauptverfasser:	KRIJNEN EDWIN EDUARD NICOLAAS JOSEPHUS, VAN LEEUWEN ROBBERT EDGAR, VANNEER ROELAND NICOLAAS MARIA, HOOGENDAM CHRISTIAAN ALEXANDER, BROEKHUIJSE JEROEN THOMAS, BRUINSMA ANASTASIUS JACOBUS ANICETUS, NIJMEIJER GERRIT JOHANNES, DRESSLER SIGURD, OTTENS CORNELIS CHRISTIAAN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A lithographic apparatus includes a measurement system including at least one optical component and at least one electrical component. The electrical component is configured to dissipate heat. The optical component is mounted on a first frame of the apparatus, and the electrical component is mounted on a second frame of the apparatus that is thermally and mechanically decoupled from the first frame. An optical coupling is provided between the first frame and the second frame.