Low firing temperature thick film dielectric layer for electroluminescent display

The present invention is a low firing temperature, composite thick film dielectric layer for an electroluminescent display. The composite thick film dielectric layer comprises; (a) a lower zone layer of a thick film composition comprising; one or more of lead magnesium niobate (PMN), lead magnesium...

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Bibliographische Detailangaben
Hauptverfasser:	MAIZHI YANG, HUI ZHANG, WU LI, WILLIAM M. SMY, DANIEL J. SEALE, SUNG-II AHN, YE YUFENG, SEONG-EUI LEE, XINGWEI WU
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY GLASS JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS
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Beschreibung
Zusammenfassung:	The present invention is a low firing temperature, composite thick film dielectric layer for an electroluminescent display. The composite thick film dielectric layer comprises; (a) a lower zone layer of a thick film composition comprising; one or more of lead magnesium niobate (PMN), lead magnesium niobate-titanate (PMN-PT), lead titanate, barium titanate and lead oxide; and a glass frit composition comprising lead oxide, boron oxide and silicon dioxide; (b) an upper zone comprising at least one layer of lead zirconate titanate (PZT) and/or barium titanate; and (c) an intermediate composite zone comprising a composite of (a) and (b).