Process monitor for laser and plasma materials processing of materials

A method for monitoring the processing of a workpiece includes directing an incident laser beam onto the workpiece and measuring a signal emitted from the workpiece. At least two signals are generated by a detector based upon the emitted signal. A workpiece processing quality is determined based upo...

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Bibliographische Detailangaben
Hauptverfasser: WOODS KENNETH J, CONNALLY WILLIAM J
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A method for monitoring the processing of a workpiece includes directing an incident laser beam onto the workpiece and measuring a signal emitted from the workpiece. At least two signals are generated by a detector based upon the emitted signal. A workpiece processing quality is determined based upon the ratio of the two output signals and a magnitude of one of the two outputs.