System, apparatus and method for automated tapeout support
A system, apparatus and method for changing/modifying a customer specific reticle set design to a reticle set design that meets a user's process standard. An example embodiment of a method of modifying layout information representing a reticle set design for an integrated circuit comprising the...
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| creator | KOCHPATCHARIN DANCHAI YONG WINSON PHUAN YEE HWEE KHEAN KENNETH NGEOW ZOO SU PING JENNIFER TEONG LIM ELIZABETH |
| description | A system, apparatus and method for changing/modifying a customer specific reticle set design to a reticle set design that meets a user's process standard. An example embodiment of a method of modifying layout information representing a reticle set design for an integrated circuit comprising the following: receiving layout information and job information; and storing the layout information and the job information; the layout information representing a reticle set design for an integrated circuit and the job information related to the reticle set design; modifying the layout information and the job information to put the layout information and the job information into a first process compatible format; using the layout information and the job information to create mask writer format information for the reticle set design; and storing the mask writer format information; and outputting the mask writer format information. In other embodiments, the method further comprises receiving changes and/or approval for said mask writer format information; and releasing the mask write format information to a mask shop. |
| format | Patent |
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An example embodiment of a method of modifying layout information representing a reticle set design for an integrated circuit comprising the following: receiving layout information and job information; and storing the layout information and the job information; the layout information representing a reticle set design for an integrated circuit and the job information related to the reticle set design; modifying the layout information and the job information to put the layout information and the job information into a first process compatible format; using the layout information and the job information to create mask writer format information for the reticle set design; and storing the mask writer format information; and outputting the mask writer format information. In other embodiments, the method further comprises receiving changes and/or approval for said mask writer format information; and releasing the mask write format information to a mask shop.</description><edition>7</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CALCULATING ; CINEMATOGRAPHY ; COMPUTING ; COUNTING ; ELECTRIC DIGITAL DATA PROCESSING ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2004</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20040916&DB=EPODOC&CC=US&NR=2004181769A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76418</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20040916&DB=EPODOC&CC=US&NR=2004181769A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KOCHPATCHARIN DANCHAI</creatorcontrib><creatorcontrib>YONG WINSON</creatorcontrib><creatorcontrib>PHUAN YEE HWEE</creatorcontrib><creatorcontrib>KHEAN KENNETH NGEOW ZOO</creatorcontrib><creatorcontrib>SU PING JENNIFER TEONG</creatorcontrib><creatorcontrib>LIM ELIZABETH</creatorcontrib><title>System, apparatus and method for automated tapeout support</title><description>A system, apparatus and method for changing/modifying a customer specific reticle set design to a reticle set design that meets a user's process standard. An example embodiment of a method of modifying layout information representing a reticle set design for an integrated circuit comprising the following: receiving layout information and job information; and storing the layout information and the job information; the layout information representing a reticle set design for an integrated circuit and the job information related to the reticle set design; modifying the layout information and the job information to put the layout information and the job information into a first process compatible format; using the layout information and the job information to create mask writer format information for the reticle set design; and storing the mask writer format information; and outputting the mask writer format information. 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An example embodiment of a method of modifying layout information representing a reticle set design for an integrated circuit comprising the following: receiving layout information and job information; and storing the layout information and the job information; the layout information representing a reticle set design for an integrated circuit and the job information related to the reticle set design; modifying the layout information and the job information to put the layout information and the job information into a first process compatible format; using the layout information and the job information to create mask writer format information for the reticle set design; and storing the mask writer format information; and outputting the mask writer format information. In other embodiments, the method further comprises receiving changes and/or approval for said mask writer format information; and releasing the mask write format information to a mask shop.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CALCULATING CINEMATOGRAPHY COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | System, apparatus and method for automated tapeout support |
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