System, apparatus and method for automated tapeout support

A system, apparatus and method for changing/modifying a customer specific reticle set design to a reticle set design that meets a user's process standard. An example embodiment of a method of modifying layout information representing a reticle set design for an integrated circuit comprising the following: receiving layout information and job information; and storing the layout information and the job information; the layout information representing a reticle set design for an integrated circuit and the job information related to the reticle set design; modifying the layout information and the job information to put the layout information and the job information into a first process compatible format; using the layout information and the job information to create mask writer format information for the reticle set design; and storing the mask writer format information; and outputting the mask writer format information. In other embodiments, the method further comprises receiving changes and/or approval for said mask writer format information; and releasing the mask write format information to a mask shop.