Electron diffraction system for use in production environment and for high pressure deposition techniques
An electron source particularly for a RHEED measurement system or a RHEED measurement system as such includes an electron emitter (5), a first deflection stage (6a, b) for radiating an electron beam onto a sample (1), and a second deflection stage between the first stage (6a, b) and the sample 1, pr...
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creator | STAIB PHILIPPE |
description | An electron source particularly for a RHEED measurement system or a RHEED measurement system as such includes an electron emitter (5), a first deflection stage (6a, b) for radiating an electron beam onto a sample (1), and a second deflection stage between the first stage (6a, b) and the sample 1, preferably near the sample. |
format | Patent |
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BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY ; MEASURING ; PHYSICS ; SCANNING-PROBE TECHNIQUES OR APPARATUS ; TESTING</subject><creationdate>2004</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20040408&DB=EPODOC&CC=US&NR=2004065844A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76418</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20040408&DB=EPODOC&CC=US&NR=2004065844A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>STAIB PHILIPPE</creatorcontrib><title>Electron diffraction system for use in production environment and for high pressure deposition techniques</title><description>An electron source particularly for a RHEED measurement system or a RHEED measurement system as such includes an electron emitter (5), a first deflection stage (6a, b) for radiating an electron beam onto a sample (1), and a second deflection stage between the first stage (6a, b) and the sample 1, preferably near the sample.</description><subject>APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBEMICROSCOPY [SPM]</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><subject>MEASURING</subject><subject>PHYSICS</subject><subject>SCANNING-PROBE TECHNIQUES OR APPARATUS</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2004</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNy0EKwjAUBNBuXIh6hw-uhapV3IpU3KvrEpKJ_dAmNT8RvL2hegBXMzBvpgXXHXQM3pFha4PSkXOXt0T0ZH2gJCB2NARv0neEe3E-9HCRlDOjavnRZgORFEAGgxcecYRuHT8TZF5MrOoEi1_OiuW5vp0uq4wbyKA0HGJzv27Ksir3u0NVHdfb_9QH391CwQ</recordid><startdate>20040408</startdate><enddate>20040408</enddate><creator>STAIB PHILIPPE</creator><scope>EVB</scope></search><sort><creationdate>20040408</creationdate><title>Electron diffraction system for use in production environment and for high pressure deposition techniques</title><author>STAIB PHILIPPE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2004065844A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2004</creationdate><topic>APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBEMICROSCOPY [SPM]</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><topic>MEASURING</topic><topic>PHYSICS</topic><topic>SCANNING-PROBE TECHNIQUES OR APPARATUS</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>STAIB PHILIPPE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>STAIB PHILIPPE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Electron diffraction system for use in production environment and for high pressure deposition techniques</title><date>2004-04-08</date><risdate>2004</risdate><abstract>An electron source particularly for a RHEED measurement system or a RHEED measurement system as such includes an electron emitter (5), a first deflection stage (6a, b) for radiating an electron beam onto a sample (1), and a second deflection stage between the first stage (6a, b) and the sample 1, preferably near the sample.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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subjects | APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBEMICROSCOPY [SPM] BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY MEASURING PHYSICS SCANNING-PROBE TECHNIQUES OR APPARATUS TESTING |
title | Electron diffraction system for use in production environment and for high pressure deposition techniques |
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