Electron diffraction system for use in production environment and for high pressure deposition techniques

An electron source particularly for a RHEED measurement system or a RHEED measurement system as such includes an electron emitter (5), a first deflection stage (6a, b) for radiating an electron beam onto a sample (1), and a second deflection stage between the first stage (6a, b) and the sample 1, pr...

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1. Verfasser: STAIB PHILIPPE
Format: Patent
Sprache:eng
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Zusammenfassung:An electron source particularly for a RHEED measurement system or a RHEED measurement system as such includes an electron emitter (5), a first deflection stage (6a, b) for radiating an electron beam onto a sample (1), and a second deflection stage between the first stage (6a, b) and the sample 1, preferably near the sample.