Process and apparatus for minimizing thermal gradients across an advanced lithographic mask

A method and system to minimize the affects of thermal gradient distortion in reticles. A heat source and filter or filters are used to control which part or parts of the reticle receive additional radiation. The heat created by this additional radiation minimizes any thermal gradients across the ma...

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Bibliographische Detailangaben
1. Verfasser:	KINDT LOUIS M
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A method and system to minimize the affects of thermal gradient distortion in reticles. A heat source and filter or filters are used to control which part or parts of the reticle receive additional radiation. The heat created by this additional radiation minimizes any thermal gradients across the mask by supplying a constant heat flux to the entire surface of the mask. The heat source can also be used to preheat the reticle to minimize any transient start-up effects.