Method for producing a unit having a three-dimensional surface patterning, and use of this method

In the method according to the invention ("lift-off method") for producing a unit (I) which is to have a three-dimensional surface patterning on a base layer (3), in a first method step a photoresist is applied to the base layer (3) in order to produce a photoresist layer (9). In a second method step, the photoresist layer (9) is subjected to masked exposure (13) which is matched to a predetermined final surface patterning. In a third method step, parts of the photoresist layer (9) are removed by developing, so that an initial surface patterning which includes photoresist subregions (25) as sacrificial layer regions is obtained. In a fourth method step, a coating (29, 31) which covers the initial surface patterning which has now been obtained is applied, in particular by sputtering, preferably as an alternating layer system. In a fifth method step, energy is applied to the initial surface patterning in order to destabilize the sacrificial layer regions (25). In a sixth method step, the initial surface patterning is acted on by a high-pressure liquid jet (33) at a predetermined treatment temperature, with the result that at least parts of the coating (29) which cover the sacrificial layer regions (25) are mechanically removed or at least broken open in order to produce the final surface patterning. In the sixth method step, the liquid of the high-pressure liquid jet (33), while it is being applied at the operating temperature, has a negligible chemical reaction rate and/or physical dissolution rate with respect to materials of the unit (3) and/or with respect to in particular organic fluid-sealing means below a measurement limit. The present invention overcomes the problems of the prior art. The object of the present invention is in particular to provide a method which makes it possible to use a life-off technique without having to use expensive solvents which are difficult to handle.