Method for producing an optical element from a quartz substrate

In a method for producing an optical element from a quartz substrate for illumination systems with illumination sources which emit beams of wavelength 157 nm or shorter, the quartz substrate is joined to a support body on at least one side. Subsequently, from the quartz substrate material is removed...

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Bibliographische Detailangaben
Hauptverfasser:	BECKER KIRSTIN, BADER DIETER, DIECKMANN NILS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	In a method for producing an optical element from a quartz substrate for illumination systems with illumination sources which emit beams of wavelength 157 nm or shorter, the quartz substrate is joined to a support body on at least one side. Subsequently, from the quartz substrate material is removed to a desired value with a thickness in the mu region. The optical element can be a diffractive optical element or diffusion plate.