Multiphoton absorption method using patterned light

Methods for producing a region of at least partially reacted material in a photoreactive composition and apparatus. The methods include: providing a photoreactive composition; providing a source of sufficient light for simultaneous absorption of at least two photons by the photoreactive composition;...

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Bibliographische Detailangaben
Hauptverfasser:	DEMASTER ROBERT D, FLORCZAK JEFFREY M, DEVOE ROBERT J, LEATHERDALE CATHERINE A, BALLEN TODD A, STACEY NICHOLAS A, FLEMING PATRICK R
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Methods for producing a region of at least partially reacted material in a photoreactive composition and apparatus. The methods include: providing a photoreactive composition; providing a source of sufficient light for simultaneous absorption of at least two photons by the photoreactive composition; providing an exposure system capable of inducing image-wise multiphoton absorption; generating a non-random three-dimensional pattern of light by means of the exposure system; and exposing the photoreactive composition to the three-dimensional pattern of light generated by the exposure system to at least partially react a portion of the material in correspondence with the non-random three-dimensional pattern of light incident thereon.