Method for objective and accurate thickness measurement of thin films on a microscopic scale

Method for objective and accurate thickness measurement of thin films on a microscopic scale

In a method and an apparatus for determining the thickness of a thin layer coated on a surface, a section is prepared and a digital image of the section is obtained. An intensity profile in the thickness direction of the layer is extracted from the digital image and is analyzed on the basis of prede...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: DE ROBILLARD QUENTIN, STEGMANN HEIKO, ENGELMANN HANS-JURGEN, SAAGE HOLGER
Format: Patent
Sprache:eng
Schlagworte:
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
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Beschreibung
Zusammenfassung:In a method and an apparatus for determining the thickness of a thin layer coated on a surface, a section is prepared and a digital image of the section is obtained. An intensity profile in the thickness direction of the layer is extracted from the digital image and is analyzed on the basis of predefined characteristics of the intensity profile to precisely determine the layer thickness. This technique is particularly advantageous in determining the layer thickness when said layer is formed on a curved surface.