Technique for writing with a raster scanned beam

Provided is a technique for generating patterns with a raster scanned beam in a photolithographic system that employs a multiple blank position flash cycle. In accordance with one embodiment of the present invention, a beam creates a shadow of a first aperture that impinges upon a region of a stop,...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: BOEGLI VOLKER, WINTER STACEY J, RISHTON STEPHEN, KAO HUEI MEI, VENEKLASEN MARY B, VENEKLASEN LEE H
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Provided is a technique for generating patterns with a raster scanned beam in a photolithographic system that employs a multiple blank position flash cycle. In accordance with one embodiment of the present invention, a beam creates a shadow of a first aperture that impinges upon a region of a stop, referred to as a first blank position. The beam is deflected so that the shadow of the first aperture moves along a first direction to a flash position, in which a portion thereof superimposes a second aperture located in the stop. To complete the flash cycle, the beam is deflected so that shadow of the first aperture impinges upon a second region of the stop, referred to as second blank position. As a result, during the flash cycle, the beam is deflected in one direction to impinge upon two different blank positions.