Process management system

A process management system in accordance with the present invention includes inspection apparatuses for inspecting defects on a wafer, the inspection apparatuses being connected through a communication network, inspection information and image information obtained from these inspection apparatuses...

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Bibliographische Detailangaben
Hauptverfasser:	ASAKAWA TERUSHIGE, SUGIMOTO HIDEKUNI, NAKAZATO JUN, SUZUKI IKUO, NOZOE MARI, MIYAZAKI ISAO, MIZUNO FUMIO, ISHIKAWA SEIJI, YOSHITAKE YASUHIRO, HAMADA TOSHIMITSU, YOKOUCHI TETSUJI, ARIGA MAKOTO, WATANABE KENJI, IKOTA MASAMI, ISOGAI SEIJI, SHIGYO YOSHIHARU, OHYAMA YUICHI, SHIBA MASATAKA
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A process management system in accordance with the present invention includes inspection apparatuses for inspecting defects on a wafer, the inspection apparatuses being connected through a communication network, inspection information and image information obtained from these inspection apparatuses being collected to construct a data base and an image file, therein definition of defects is given by combinations of elements which characterize the defect based on the inspection information and the image information obtained from the inspection apparatuses. By giving definition of the defect, characteristics of the defect can be subdivided and known. Therefore, the cause of a defect can be studied.