Lithographic method using variable-area electron-beam lithography machine

A lithographic method by the use of a variable-area electron-beam lithography machine makes use of an electron beam having a cross section shaped into right-angled isosceles triangles. The lithography machine can shape the cross section into the right-angled isosceles triangles or a rectangle. Where...

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1. Verfasser:	WAKIMOTO OSAMU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A lithographic method by the use of a variable-area electron-beam lithography machine makes use of an electron beam having a cross section shaped into right-angled isosceles triangles. The lithography machine can shape the cross section into the right-angled isosceles triangles or a rectangle. Where a trapezoidal figure to be written has at least one leg (oblique side) making an angle of 45 degrees with the normal to the bottom base, a portion including the 45-degree leg is extracted and written by the right-angled isosceles triangles.