Use of selective oxidation to improve LDMOS power transistors
The invention includes a laterally diffused metal oxide semiconductor transistor comprising a gate electrode and comprising tapered oxide self aligned to the gate electrode and a method of making the transistor.
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | The invention includes a laterally diffused metal oxide semiconductor transistor comprising a gate electrode and comprising tapered oxide self aligned to the gate electrode and a method of making the transistor. |
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