$Method and apparatus for simultaneous measurement of the refractive index and thickness of thin films$

Method and apparatus for simultaneous measurement of the refractive index and thickness of thin films

A beam deflection technique for simultaneous measurements of the thickness, refractive index and optical absorption of transparent materials using a charge coupled device (CCD) camera is provided. The method comprises measuring beam deflection after transmission through or reflection off a sample of...

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Bibliographische Detailangaben
Hauptverfasser:	MELIKECHI NOUREDDINE, MIAN SHABBIR M, AMARA MOHAMED KAMEL
Format:	Patent
Sprache:	eng
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING
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Beschreibung
Zusammenfassung:	A beam deflection technique for simultaneous measurements of the thickness, refractive index and optical absorption of transparent materials using a charge coupled device (CCD) camera is provided. The method comprises measuring beam deflection after transmission through or reflection off a sample of interest at variable incidence angles to the sample surface. The measurement of beam deflection as a function of incident angle is related through Snell's Law directly to the sample thickness and sample index of refraction.