Method and photo mask for manufacturing an array substrate

A method of manufacturing an array substrate comprising; depositing an amorphous material on a transparent substrate; and changing said amorphous material to a polycrystalline material by irradiation of energy beams through a photo mask, said mask including a transparent region permitting said energy beams to pass through and a shutoff region surrounding said transparent region and interrupting said energy beams, said transparent region being defined by first and second lengthwise direction lines extending substantially in parallel to each other, first and second slanting direction lines which extend from opposed ends of said lengthwise direction lines after declining by angles larger than 90 degrees to join with each other; and third and fourth slanting direction lines which extend from the other opposed ends of said lengthwise direction lines after declining by angles larger than 90 degrees to join with each other, said transparent region having a length in the extending direction of said first and second lengthwise direction lines, which is longer than the length of said transparent region in the direction perpendicular to the extending direction of said first and second lengthwise direction lines, wherein changing said amorphous material to the polycrystalline material includes: moving said transparent substrate by a constant distance perpendicularly to the lengthwise direction of a flat pattern projected onto the surface of said amorphous material when energy beams passing through said transparent region are irradiated onto said amorphous material; and irradiating said energy beams onto said amorphous material every time when said transparent substrate is moved.