Photo-crosslinkable nail varnishes free of unsaturated monomers

The invention relates to a photo-crosslinkable nail varnish composition that is free of reactive monomers comprising one or more ethylenic double bonds and containing, in a physiologically acceptable medium, a) one or more polymers comprising ethylenic double bonds, the average number of ethylenic d...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: MONDET JEAN, BERNARD PASCALE
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The invention relates to a photo-crosslinkable nail varnish composition that is free of reactive monomers comprising one or more ethylenic double bonds and containing, in a physiologically acceptable medium, a) one or more polymers comprising ethylenic double bonds, the average number of ethylenic double bonds per polymer molecule being greater than 1, and b) from 0.1% to 10% by weight, relative to the total weight of polymer (a) comprising ethylenic double bonds, of at least one free-radical photo-initiator, and also to a cosmetic process for coating nails or false nails using such a composition.