Photo-crosslinkable nail varnishes free of unsaturated monomers
The invention relates to a photo-crosslinkable nail varnish composition that is free of reactive monomers comprising one or more ethylenic double bonds and containing, in a physiologically acceptable medium, a) one or more polymers comprising ethylenic double bonds, the average number of ethylenic d...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | The invention relates to a photo-crosslinkable nail varnish composition that is free of reactive monomers comprising one or more ethylenic double bonds and containing, in a physiologically acceptable medium, a) one or more polymers comprising ethylenic double bonds, the average number of ethylenic double bonds per polymer molecule being greater than 1, and b) from 0.1% to 10% by weight, relative to the total weight of polymer (a) comprising ethylenic double bonds, of at least one free-radical photo-initiator, and also to a cosmetic process for coating nails or false nails using such a composition. |
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